Plasma Emission Measurement
An objectively and
continuously process control of low-pressure plasma deposition techniques,
such as PVD (Physical Vapor Deposition), is one of the
real issues today. Aside from a visual examination of the plasma's light
emission, sometimes the mass spectroscopy technique is used. Specially the
mass spectroscopy is neither handy to operate nor the results are easy to
interpret. Compared with this, the benefits of using the OES (Optical
Emission Spectroscopy) and our fiber optics coupled
TranSpec-DSP spectrometers are
obvious:
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Simultaneous
Measurement in the spectral range 200...1000 nm
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Fast Measurement -
within Milliseconds
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Detection of even
Very Low Emission Intensities
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Connectable to
every Vacuum Chamber using a regular flange
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Maintenance-Free
and Easy-to-Use Technology
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Convenient System
Software TranSpec 2000
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